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Dynamical Model for the Formation of Patterned Deposits at Receding Contact Lines by Frastia, Lubor; Archer, Andrew J.; Thiele, Uwe is a scholarly article available to read on EtoBox.

What is Dynamical Model for the Formation of Patterned Deposits at Receding Contact Lines about?

We describe the formation of deposition patterns that are observed in many different experiments where a three-phase contact line of a volatile nanoparticle suspension or polymer solution recedes. A dynamical model based on a long-wave approximation predicts the deposition of irregular and regular line patterns due to self-organised pinning-depinning cycles corresponding to a stick-slip motion of the contact line. We analyze how the line pattern properties depend on the evaporation rate and solute concentration.

Author

Frastia, Lubor; Archer, Andrew J.; Thiele, Uwe

Published

2010

Language

EN