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About this Engineering article
Post Plasma Oxidation Processed ALD Al 2 O 3 /Hf 1-x Zr x O 2 Thin Films on Ge Substrates: Reliability by Bhuyian, M. N.; Shao, P.; Sengupta, A.; Ding, Y.; Misra, D.; Tapily, K.; Clark, R. D.; Consiglio, S.; Wajda, C. S.; Leusink, G. J. is a Engineering article available to read on EtoBox.
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- Author
- Bhuyian, M. N.; Shao, P.; Sengupta, A.; Ding, Y.; Misra, D.; Tapily, K.; Clark, R. D.; Consiglio, S.; Wajda, C. S.; Leusink, G. J.
- Publisher
- The Electrochemical Society; Electrochemical Society, Inc. (ISSN 2162-8769)
- Published
- 2018
- Language
- EN
- Field
- Engineering (Physical Sciences)