About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - A study of source and mask optimization for ArF scanners by Matsuyama, Tomoyuki; Levinson, Harry J.; Dusa, Mircea V.; Nakashima, Toshiharu; Noda, Tomoya is a scholarly article available to read on EtoBox.

Author

Matsuyama, Tomoyuki; Levinson, Harry J.; Dusa, Mircea V.; Nakashima, Toshiharu; Noda, Tomoya

Publisher

SPIE

Published

2009