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About this Engineering article
On the use of methane as a carbon precursor in Chemical Vapor Deposition of silicon carbide by Yazdanfar, M.; Pedersen, H.; Sukkaew, P.; Ivanov, I.G.; Danielsson, Ö.; Kordina, O.; Janzén, E. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Yazdanfar, M.; Pedersen, H.; Sukkaew, P.; Ivanov, I.G.; Danielsson, Ö.; Kordina, O.; Janzén, E.
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0022-0248)
- Published
- 2014
- Language
- EN
- Field
- Engineering (Physical Sciences)