About this scholarly article

2001 6th International Symposium on Plasma- and Process-Induced Damage (IEEE Cat. No.01TH8538) - Contamination issues in plasma etching of non-volatile materials: managing by-product deposition by Olson, K.A.; Jerde, L.; Almerico, J.P. is a scholarly article available to read on EtoBox.

Author

Olson, K.A.; Jerde, L.; Almerico, J.P.

Publisher

American Vacuum Soc

Published

2001

Language

EN