About this scholarly article

Twenty Third IEEE/CPMT International Electronics Manufacturing Technology Symposium (Cat. No.98CH36205) - Reducing costs and increasing throughput using model-based process control on sputtering systems by Sattler, L.; Hecker, P.E.; Raghavan, R.; Lin, H. is a scholarly article available to read on EtoBox.

Author

Sattler, L.; Hecker, P.E.; Raghavan, R.; Lin, H.

Publisher

IEEE

Published

1998

Language

EN