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The influence of V/III ratio in the initial growth stage on the properties of GaN epilayer deposited on low temperature AlN buffer layer by D.G. Zhao; D.S. Jiang; J.J. Zhu; Z.S. Liu; S.M. Zhang; Hui Yang; J.W. Liang is a Engineering article available to read on EtoBox.

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The V/III ratio in the initial growth stage of metalorganic chemical vapor deposition has an important influence on the quality of a GaN epilayer grown on a low-temperature AlN buffer layer and c-plane sapphire substrate. A weaker yellow luminescence, a narrower half-width of the X-ray diffraction peak, and a higher electron mobility result when a lower V/III ratio is taken. The intensity of in situ optical reflectivity measurements indicates that the film surface is rougher at the beginning of GaN growth, and a longer time is needed for the islands to coalesce and for a quasi-two dimensional mode growth to start. A comparison of front-and back-illuminated photoluminescence spectra confirms that many threading dislocations are bent during the initial stage, leading to a better structural quality of the GaN layer.

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Author

D.G. Zhao; D.S. Jiang; J.J. Zhu; Z.S. Liu; S.M. Zhang; Hui Yang; J.W. Liang

Publisher

Elsevier Science; Elsevier ; Elsevier BV (ISSN 0022-0248)

Published

2007

Language

EN

Field

Engineering (Physical Sciences)