About this Engineering article
Rigorous electromagnetic simulation of mask magnification effects on the diffracted light for EUV binary mask by Chun-Hung Lin; Hsuen-Li Chen; Fu-Hsiang Ko is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Chun-Hung Lin; Hsuen-Li Chen; Fu-Hsiang Ko
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0167-9317)
- Published
- 2007
- Field
- Engineering (Physical Sciences)