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About this Engineering article
Effect of Cl[sub 2]∕Ar gas mixing ratio on (Pb,Sr)TiO[sub 3] thin film etching behavior in inductively coupled plasma by Kim, Gwan-Ha; Kim, Chang-Il is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Kim, Gwan-Ha; Kim, Chang-Il
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-2101)
- Published
- 2006
- Language
- EN
- Field
- Engineering (Physical Sciences)