Skip to content

Opening book details…

About this Engineering article

Deep Subwavelength Nanolithography Using Localized Surface Plasmon Modes on Planar Silver Mask by W. Srituravanich; S. Durant; H. Lee; C. Sun; X. Zhang is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author
W. Srituravanich; S. Durant; H. Lee; C. Sun; X. Zhang
Publisher
AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-211X)
Published
2005
Field
Engineering (Physical Sciences)

More by W. Srituravanich; S. Durant; H. Lee; C. Sun; X. Zhang

Browse all works by W. Srituravanich; S. Durant; H. Lee; C. Sun; X. Zhang