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About this Engineering article
In situ fabrication of metal gate/high-κ dielectric gate stacks using a potential lower cost front-end process for the sub-90 nm CMOS technology node by D. Damjanovic; R. Singh; K. F. Poole is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- D. Damjanovic; R. Singh; K. F. Poole
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-211X)
- Published
- 2005
- Language
- EN
- Field
- Engineering (Physical Sciences)