About this scholarly article

SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II - Computational method for the correction of proximity effect in electron-beam lithography (Poster Paper) by Chang, Chih-Yuan; Owen, Gerry; Pease, Roger Fabian W.; Kailath, Thomas; Peckerar, Martin C. is a scholarly article available to read on EtoBox.

Author

Chang, Chih-Yuan; Owen, Gerry; Pease, Roger Fabian W.; Kailath, Thomas; Peckerar, Martin C.

Publisher

SPIE

Published

1992