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About this Materials Science article
Radiation Chemical Yields and Lithographic Performance of Electron-beam Resists Based on Poly(methylstyrene-co-chlorostyrene) by Jones, Richard G.; Tate, Philip C. Miller; Brambley, David R. is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Jones, Richard G.; Tate, Philip C. Miller; Brambley, David R.
- Publisher
- Royal Society of Chemistry; The Royal Society of Chemistry; Royal Society of Chemistry (RSC) (ISSN 0959-9428)
- Published
- 1991
- Field
- Materials Science (Physical Sciences)
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