About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Effect of PAG and matrix structure on PAG acid generation behavior under UV and high-energy radiation exposure by Henderson, Clifford L.; Lee, Cheng-Tsung; Wang, Mingxing; Gonsalves, Kenneth E.; Yueh, Wang; Roberts, Jeanette M.; Younkin, Todd R.; Henderson, Clifford L. is a scholarly article available to read on EtoBox.

Author

Henderson, Clifford L.; Lee, Cheng-Tsung; Wang, Mingxing; Gonsalves, Kenneth E.; Yueh, Wang; Roberts, Jeanette M.; Younkin, Todd R.; Henderson, Clifford L.

Publisher

SPIE

Published

2008

Language

EN