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Can I read Titanium Thin Film Deposition in a Deuterium Atmosphere on EtoBox?
Titanium Thin Film Deposition in a Deuterium Atmosphere by R. Checchetto is a Engineering article available to read on EtoBox.
What is Titanium Thin Film Deposition in a Deuterium Atmosphere about?
Titanium thin films have been deposited on Si(100) wafers by electron beam evaporation in the 50-450 °C temperature range. Some samples were deposited in high vacuum conditions while others in a deuterium gas atmosphere with the aim to study the effect of the D e gas on the crystallographic orientation of the deposited layers. Compositional studies of the titanium films have been carried out by elastic recoil detection analysis and Rutherford backscattering spectroscopy, while structural analysis was performed by X-ray difli-action. It was fbund that Ti films deposited in a high vacuum present the (002) (minimum surface energy) preferred orientation. Titanium film deposited in a deuterium atmosphere at low temperatures present high concentration of adsorbed deuterium and show the (100) (maximum surface energy) preferred orientation; when deposited at high temperatures samples present very low deuterium concentrations and show again the (002) preferred orientation. A possible explanation of the above results is that the surface mobility of Ti ad-atoms is limited by D z molecule adsorption, owing to the surface site occupancy.
Who reads Titanium Thin Film Deposition in a Deuterium Atmosphere?
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- R. Checchetto
- Publisher
- Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)
- Published
- 1997
- Language
- EN
- Field
- Engineering (Physical Sciences)