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About this Engineering article
Realistic Etch Yield of Fluorocarbon Ions in SiO 2 Etch Process by Hikosaka, Yukinobu; Hayashi, Hisataka; Sekine, Makoto; Tsuboi, Hideo; Endo, Mitsuhiro; Mizutani, Naoki is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Hikosaka, Yukinobu; Hayashi, Hisataka; Sekine, Makoto; Tsuboi, Hideo; Endo, Mitsuhiro; Mizutani, Naoki
- Publisher
- Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
- Published
- 1999
- Language
- EN
- Field
- Engineering (Physical Sciences)