About this scholarly article

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Dissolution-rate analysis of ArF resist polymers based on the percolation model by Yamaguchi, Atsuko; Kishimura, Shinji; Matsuzawa, Nobuyuki N.; Ohfuji, Takeshi; Tanaka, Tomoaki; Tagawa, Seiichi; Sasago, Masaru is a scholarly article available to read on EtoBox.

Author

Yamaguchi, Atsuko; Kishimura, Shinji; Matsuzawa, Nobuyuki N.; Ohfuji, Takeshi; Tanaka, Tomoaki; Tagawa, Seiichi; Sasago, Masaru

Publisher

SPIE

Published

1998