About this scholarly article

Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) - Productivity improvement for dry etch equipment through the application of simulation by Pampel, S.; Domaschke, J.; Jetter, H. is a scholarly article available to read on EtoBox.

Author

Pampel, S.; Domaschke, J.; Jetter, H.

Publisher

Ultra Clean Soc

Published

2000

Language

EN