Opening book details…
About this Engineering article
Thermal Stabilities of ALD-HfO2 Films on HF- and (NH4)2S-Cleaned InP by An, Chee-Hong; Byun, Young-Chul; Lee, Myung Soo; Kim, Hyoungsub is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- An, Chee-Hong; Byun, Young-Chul; Lee, Myung Soo; Kim, Hyoungsub
- Publisher
- The Electrochemical Society; Electrochemical Society, Inc. (ISSN 0013-4651)
- Published
- 2011
- Language
- EN
- Field
- Engineering (Physical Sciences)
More by An, Chee-Hong; Byun, Young-Chul; Lee, Myung Soo; Kim, Hyoungsub
Browse all works by An, Chee-Hong; Byun, Young-Chul; Lee, Myung Soo; Kim, Hyoungsub