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About this Engineering article
WITHDRAWN: Application of fluorine doped oxide (SiOF) spacers for improving reliability in low temperature polycrystalline thin film transistors by Feng, Li-Wei; Chang, Ting-Chang; Liu, Po-Tsun; Tu, Chun-Hao; Wu, Yung-Chun; Yang, Che-Yu; Chang, Chun-Yen is a Engineering article available to read on EtoBox.
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- Author
- Feng, Li-Wei; Chang, Ting-Chang; Liu, Po-Tsun; Tu, Chun-Hao; Wu, Yung-Chun; Yang, Che-Yu; Chang, Chun-Yen
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0257-8972)
- Published
- 2008
- Field
- Engineering (Physical Sciences)