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Fabrication and characterization of Pt intermediate transparent and conducting ITO/Pt/ITO multilayer films by J.I. Choi; J.Y. Lee; J.H. Park; J.H. Chae; H.J. Park; Daeil Kim is a Materials Science article available to read on EtoBox.

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Platinum intermediate transparent and conducting ITO/metal/ITO (IMI) multilayered films were deposited by RF and DC magnetron sputtering on polycarbonate substrates without intentional substrate heating. Changes in the microstructure and optoelectrical properties of the films were investigated with respect to the thickness of the intermediate Pt layer in the IMI films. The thickness of Pt film was varied from 5 to 20 nm. In XRD measurements, neither ITO single-layer films nor IMI multilayer films showed any characteristic diffraction peaks for In 2 O 3 or SnO 2 . Only a weak diffraction peak for Pt (111) was obtained in the XRD spectra. Thus, it can be concluded that the Pt-intermediated films in the IMI films did not affect the crystallinity of the ITO films. However, equivalent resistivity was dependent on the presence and thickness of the Pt-intermediated layer. It decreased as low as 3.3 Â 10 À4 O cm for ITO 50 nm/Pt 20 nm/ITO 30 nm films. Optical transmittance was also strongly influenced by the Pt-intermediated layer. As Pt thickness in the IMI films increased, optical transmittance decreased to as low as 30% for ITO 50 nm/Pt 20 nm/ITO 30 nm films.

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Author

J.I. Choi; J.Y. Lee; J.H. Park; J.H. Chae; H.J. Park; Daeil Kim

Publisher

Elsevier Science; Elsevier ; Elsevier Ltd.; Elsevier BV (ISSN 0022-3697)

Published

2009

Language

EN

Field

Materials Science (Physical Sciences)