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About this Materials Science article

Metal Interconnect Development: Design and Long-Term Stability by Elangovan, S. is a Materials Science article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Materials Science.

Author
Elangovan, S.
Publisher
The Electrochemical Society (ISSN 0161-6374)
Published
2003
Field
Materials Science (Physical Sciences)

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