About this scholarly article

First International Conference on Integration and Commercialization of Micro and Nanosystems, Parts A and B - Three-Dimensional Discharge Simulation of Inductively Coupled Plasma Etcher by Cheng, Jia; Zhu, Yu; Duan, Guanghong; Chen, Yangying is a scholarly article available to read on EtoBox.

Author

Cheng, Jia; Zhu, Yu; Duan, Guanghong; Chen, Yangying

Publisher

ASMEDC

Published

2007

Language

EN