Can I read Microwave Plasma Modelling in Clamshell Chemical Vapour Deposition Diamond Reactors on EtoBox?

Microwave Plasma Modelling in Clamshell Chemical Vapour Deposition Diamond Reactors by Jerome A. Cuenca; Soumen Mandal; Evan L.H. Thomas; Oliver A. Williams is a Materials Science article available to read on EtoBox.

What is Microwave Plasma Modelling in Clamshell Chemical Vapour Deposition Diamond Reactors about?

A microwave plasma model of a chemical vapour deposition (CVD) reactor is presented for understanding spatial heteroepitaxial growth of polycrystalline diamond on Si. This work is based on the TM 0(n>1) clamshell style reactor (Seki Diamond/ASTEX SDS 6K, Carat CTS6U, ARDIS-100 style) whereby a simplified H 2 plasma model is used to show the radial variation in growth rate over small samples with different sample holders. The model uses several steps: an electromagnetic (EM) eigenfrequency solution, a frequency-transient EM/plasma fluid solution and a transient heat transfer solution at low and high microwave power densities. Experimental growths provide model validation with characterisation using Raman spectroscopy and scanning electron microscopy. This work demonstrates that shallow holders result in non-uniform diamond films, with a radial variation akin to the electron density, atomic H density and temperature distribution at the wafer surface. For the same process conditions, greater homogeneity is observed for taller holders, however, if the height is too extreme, the diamond quality reduces. From a modelling perspective, EM solutions are limited but useful for examining elec

Who reads Microwave Plasma Modelling in Clamshell Chemical Vapour Deposition Diamond Reactors?

Author

Jerome A. Cuenca; Soumen Mandal; Evan L.H. Thomas; Oliver A. Williams

Publisher

Elsevier BV

Published

2022

Language

EN

Field

Materials Science (Physical Sciences)