About this scholarly article

SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - New algorithm for optical photomask CD metrology for the 100-nm node by Doe, Nicholas G.; Eandi, Richard D.; St. Cin, Patrick; Dao, Giang T.; Grenon, Brian J. is a scholarly article available to read on EtoBox.

Author

Doe, Nicholas G.; Eandi, Richard D.; St. Cin, Patrick; Dao, Giang T.; Grenon, Brian J.

Publisher

SPIE

Published

2002

Language

EN