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About this Engineering article
Impact of Snapback Stress on the Degradation of ultra-short and Ultra-thin LDD NMOSFET by Hu Shigang; Wu Xiaofeng; Xi Zaifang is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Hu Shigang; Wu Xiaofeng; Xi Zaifang
- Publisher
- Elsevier ; [Oxford]: Elsevier Ltd.; Elsevier BV (ISSN 1877-7058)
- Published
- 2011
- Language
- EN
- Field
- Engineering (Physical Sciences)