About this scholarly article

Silylating Reagents with High Silicon Contents for Dry-Developed Positive-Tone Resists for Extreme-UV (13.5 nm) and Deep-UV (248 nm) Microlithography by Clough, Roger L.; Shalaby, Shalaby W. is a scholarly article available to read on EtoBox.

Author

Clough, Roger L.; Shalaby, Shalaby W.

Publisher

American Chemical Society

Published

1996