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Can I read Removal of Clinically Significant Antibiotics from Aqueous Solutions by Applying Unique High-throughput Continuous-flow Plasma Pencil and Plasma Brush Systems on EtoBox?

Removal of Clinically Significant Antibiotics from Aqueous Solutions by Applying Unique High-throughput Continuous-flow Plasma Pencil and Plasma Brush Systems by Dominik Terefinko; Magda Caban; Agata Motyka-Pomagruk; Weronika Babinska; Pawel Pohl; Piotr Jamroz; Piotr Cyganowski; Wojciech Sledz; Ewa Lojkowska; Piotr Stepnowski; Anna Dzimitrowicz is a Engineering article available to read on EtoBox.

What is Removal of Clinically Significant Antibiotics from Aqueous Solutions by Applying Unique High-throughput Continuous-flow Plasma Pencil and Plasma Brush Systems about?

High demands of medical and husbandry sectors led to a massive annual production of 100,000 tonnes of various antibiotics on a global scale. Considering that an access to sublethal doses of these pharmaceuticals causes subsequent increase in resistance of virulent human bacterial pathogens, there is a substantial need for development of novel methods and techniques for degradation of antibiotics from aqueous solutions. Here, high-throughput continuous flow plasma pencil and plasma brush methodologies were developed and verified for their applicability for removal of antibiotics from solutions, as estimated by high-performance liquid chromatography coupled with diode-array detection (HPLC-DAD) or ultraperformance liquid chromatography coupled with tandem mass spectrometry (UPLC-MS/MS). The removal efficiency of drugs treated by the plasma pencil was in the range from 3 to 24%, and was corresponded to with 1.39% to 10.76% losses in the antibacterial properties of the plasma-treated solutions. However, application of a unique plasma brush increased the antibiotics degradation rates significantly, now falling in the range from 29 to 67% that led to 12.06–81.59% decrease in the antimicr

Who reads Removal of Clinically Significant Antibiotics from Aqueous Solutions by Applying Unique High-throughput Continuous-flow Plasma Pencil and Plasma Brush Systems?

It is typically read by researchers, students, and practitioners in Engineering.

Author
Dominik Terefinko; Magda Caban; Agata Motyka-Pomagruk; Weronika Babinska; Pawel Pohl; Piotr Jamroz; Piotr Cyganowski; Wojciech Sledz; Ewa Lojkowska; Piotr Stepnowski; Anna Dzimitrowicz
Publisher
Elsevier BV
Published
2023
Language
EN
Field
Engineering (Physical Sciences)

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