Opening book details…
About this Physics and Astronomy article
Plasma Uniformity and Phase-controlled Etching in a Very High Frequency Capacitive Discharge by D. Sung; J. Woo; K. Lim; K. Kim; V. Volynets; G. Kim is a Physics and Astronomy article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Physics and Astronomy.
- Author
- D. Sung; J. Woo; K. Lim; K. Kim; V. Volynets; G. Kim
- Publisher
- American Institute of Physics; AIP Publishing; Publons (ISSN 0021-8979)
- Published
- 2009
- Language
- EN
- Field
- Physics and Astronomy (Physical Sciences)
More by D. Sung; J. Woo; K. Lim; K. Kim; V. Volynets; G. Kim
Browse all works by D. Sung; J. Woo; K. Lim; K. Kim; V. Volynets; G. Kim