About this document
EUV Microexposures at The ALS Using The 0.3-NA MET Projection Optics by pinocchio84 is a document available to read on EtoBox.
The document discusses the development and capabilities of a new 0.3-NA Micro Exposure Tool (MET) for extreme ultraviolet (EUV) lithography at Lawrence Berkeley National Laboratory. The MET system enables ultra-high resolution microexposures, achieving feature sizes down to 12 nm using advanced programmable coherence illumination techniques. Results from various experimental resists demonstrate the system
- Author
- pinocchio84
- Language
- EN