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About this Engineering article
Influence of Nitrogen Incorporation in Hydrogenated Amorphous Silicon Films Prepared by Photochemical Vapor Deposition by Hiramatsu, Masato; Kamimura, Takaaki; Nakajima, Mitsuo; Ito, Hiroshi is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Hiramatsu, Masato; Kamimura, Takaaki; Nakajima, Mitsuo; Ito, Hiroshi
- Publisher
- Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
- Published
- 1991
- Language
- EN
- Field
- Engineering (Physical Sciences)
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