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Characterization and metrology for ULSI technology, 2000 : international conference, Gaithersburg, Maryland, 26-29 June 2000 by David G. Seiler; Alain C. Diebold; Thomas J. Shaffner; Robert McDonald; W. Murray Bullis; Patrick J. Smith; Erik M. Secula is a engineering available to read on EtoBox.
What is Characterization and metrology for ULSI technology, 2000 : international conference, Gaithersburg, Maryland, 26-29 June 2000 about?
The worldwide semiconductor community faces increasingly difficult challenges as it moves into the manufacturing of chips with feature sizes approaching 100 nm. Some of the challenges are materials-related, such as transistors with high-k dielectrics and on-chip interconnects made from copper and low-k dielectrics. The magnitude of these challenges demands special attention from those in the metrology and analytical measurements community. Characterization and metrology are key enablers for deve
Who reads Characterization and metrology for ULSI technology, 2000 : international conference, Gaithersburg, Maryland, 26-29 June 2000?
It is typically read by working professionals who need an authoritative practice reference.
Common subject areas: medicine, law, business, engineering.
- Author
- David G. Seiler; Alain C. Diebold; Thomas J. Shaffner; Robert McDonald; W. Murray Bullis; Patrick J. Smith; Erik M. Secula
- Publisher
- American Institute of Physics Springer [distributor
- Published
- 2000
- Language
- EN
- ISBN
- 9781563969676
- Category
- engineering
- Subjects
- Engineering, Mathematics, Science
- Updated
- 2026-03-25
Other editions & translations
More by David G. Seiler; Alain C. Diebold; Thomas J. Shaffner; Robert McDonald; W. Murray Bullis; Patrick J. Smith; Erik M. Secula
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