About this scholarly article

SPIE Proceedings [SPIE 31st European Mask and Lithography Conference - Eindhoven, Netherlands (Monday 22 June 2015)] 31st European Mask and Lithography Conference - Skeleton-based OPC application for DSA full chip mask correction by Behringer, Uwe F.W.; Finders, Jo; Schneider, L.; Farys, V.; Serret, E.; Fenouillet-Beranger, C. is a scholarly article available to read on EtoBox.

Author

Behringer, Uwe F.W.; Finders, Jo; Schneider, L.; Farys, V.; Serret, E.; Fenouillet-Beranger, C.

Publisher

SPIE

Published

2015