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About this Engineering article
The Formation of Highly Conductive Shallow Junction Layers in (100) Siliconl By Gallium Ion Implantation by Harrison, H.B.; Li, Y.H.; Sai-Halasz, G.A.; Iyer, S. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Harrison, H.B.; Li, Y.H.; Sai-Halasz, G.A.; Iyer, S.
- Publisher
- Cambridge University Press; Cambridge University Press (Materials Research Society); Cambridge University Press (CUP) (ISSN 0272-9172)
- Published
- 1986
- Field
- Engineering (Physical Sciences)
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