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About this Engineering article
Ambient-Pressure XPS Study of GeO2/Ge(100) and SiO2/Si(100) at Controlled Relative Humidity by Arima, K.; Kawai, Y.; Minoura, Y.; Saito, Y.; Mori, D.; Oka, H.; Kawai, K.; Hosoi, T.; Liu, Z.; Watanabe, H.; Morita, M. is a Engineering article available to read on EtoBox.
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- Author
- Arima, K.; Kawai, Y.; Minoura, Y.; Saito, Y.; Mori, D.; Oka, H.; Kawai, K.; Hosoi, T.; Liu, Z.; Watanabe, H.; Morita, M.
- Publisher
- The Electrochemical Society; Electrochemical Society, Inc. (ISSN 1938-6737)
- Published
- 2014
- Language
- EN
- Field
- Engineering (Physical Sciences)