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About this Engineering article
Masked ion beam lithography: an emerging technology : John L. Bartelt. Solid St. Technol., 215 (May 1986) is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0026-2714)
- Published
- 1987
- Language
- EN
- Field
- Engineering (Physical Sciences)