About this scholarly article

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Optimized thick film processing for bumping layers by Wanat, Stanley F.; Plass, Robert; Sison, Ernesto S.; Zhuang, Hong; Lu, Ping-Hung; Hamel, Clifford; Guevremont, Jeffrey M.; Fedynyshyn, Theodore H. is a scholarly article available to read on EtoBox.

Author

Wanat, Stanley F.; Plass, Robert; Sison, Ernesto S.; Zhuang, Hong; Lu, Ping-Hung; Hamel, Clifford; Guevremont, Jeffrey M.; Fedynyshyn, Theodore H.

Publisher

SPIE

Published

2003

Language

EN