About this scholarly article

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 19 September 2011)] Photomask Technology 2011 - EUV multilayer defect compensation (MDC) by absorber pattern modification: from theory to wafer validation by Pang, Linyong; Maurer, Wilhelm; Abboud, Frank E.; Hu, Peter; Satake, Masaki; Tolani, Vikram; Peng, Danping; Li, Ying; Chen, Dongxue is a scholarly article available to read on EtoBox.

Author

Pang, Linyong; Maurer, Wilhelm; Abboud, Frank E.; Hu, Peter; Satake, Masaki; Tolani, Vikram; Peng, Danping; Li, Ying; Chen, Dongxue

Publisher

SPIE

Published

2011

Language

EN