About this scholarly article

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - Printability of topography in alternating aperture phase-shift masks by Philipsen, Vicky; Jonckheere, Rik; Staud, Wolfgang; Weed, J. Tracy is a scholarly article available to read on EtoBox.

Author

Philipsen, Vicky; Jonckheere, Rik; Staud, Wolfgang; Weed, J. Tracy

Publisher

SPIE

Published

2004