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Can I read Fabrication of sub-quarter-micron grating patterns by employing DUV holographic lithography on EtoBox?
Fabrication of sub-quarter-micron grating patterns by employing DUV holographic lithography by L.A. Wang; C.H. Lin; J.H. Chen is a Engineering article available to read on EtoBox.
What is Fabrication of sub-quarter-micron grating patterns by employing DUV holographic lithography about?
Sub-quarter-micron grating patterns with period as fine as 0.22 p.m have been obtained by combining DUV holographic lithography and silylation technique for the first time. A traditional chemical amplified resist (JSR KRF/K2G) originally working for single layer process at 248 nm wavelength was used for silylation. The silylation selectivity was improved by process control and a photoresist pattern with an aspect ration of 4 was obtained.
Who reads Fabrication of sub-quarter-micron grating patterns by employing DUV holographic lithography?
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- L.A. Wang; C.H. Lin; J.H. Chen
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0167-9317)
- Published
- 1999
- Language
- EN
- Field
- Engineering (Physical Sciences)