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About this Engineering article
Influence of a 5 Å Tantalum Nitride Interface Layer on Dielectric Properties of Zirconium-Doped Tantalum Oxide High-k Films by Tewg, Jun-Yen; Kuo, Yue; Lu, Jiang; Schueler, Bruno W. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Tewg, Jun-Yen; Kuo, Yue; Lu, Jiang; Schueler, Bruno W.
- Publisher
- The Electrochemical Society; Electrochemical Society, Inc. (ISSN 0013-4651)
- Published
- 2005
- Language
- EN
- Field
- Engineering (Physical Sciences)
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