Opening book details…
About this book
HfS2 thin films deposited at room temperature by an emerging technique, solution atomic layer deposition by Yuanyuan Cao, Sha Zhu, Julien Bachmann is a book available to read on EtoBox.
- Author
- Yuanyuan Cao, Sha Zhu, Julien Bachmann
- Publisher
- Royal Society of Chemistry
- Language
- EN
More by Yuanyuan Cao, Sha Zhu, Julien Bachmann
Browse all works by Yuanyuan Cao, Sha Zhu, Julien Bachmann
Similar books
- Atomic/molecular Layer Deposition of Ni-terephthalate Thin Films — Anish Philip, Sami Vasala, Pieter Glatzel, Maarit Karppinen
- Liquid Atomic Layer Deposition as Emergent Technology for the Fabrication of Thin Films — Octavio Graniel, Josep Puigmartí-Luis, David Muñoz-Rojas
- Thermal Atomic Layer Deposition of Rhenium Nitride and Rhenium Metal Thin Films Using Methyltrioxorhenium — Stefan Cwik, Keenan N. Woods, S. Sameera Perera, Mark J. Saly, Thomas J. Knisley, Charles H. Winter
- Evaluation of Sn(II) Aminoalkoxide Precursors for Atomic Layer Deposition of SnO Thin Films — James D. Parish, Michael W. Snook, Andrew L. Johnson
- SiO2 Thin Film Growth Through a Pure Atomic Layer Deposition Technique at Room Temperature — D. Arl & V. Rogé & N. Adjeroud & B. R. Pistillo & M. Sarr & N. Bahlawane & D. Lenoble
- Molecular Layer Deposition of Photoactive Metal-naphthalene Hybrid Thin Films — Melania Rogowska, Per-Anders Hansen, Henrik Hovde Sønsteby, Joanna Dziadkowiec, Håkon Valen, Ola Nilsen