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About this Engineering article
High Rate Deposition of Microcrystalline Silicon Using Conventional Plasma-Enhanced Chemical Vapor Deposition by Guo, Lihui; Kondo, Michio; Fukawa, Makoto; Saitoh, Kimihiko; Matsuda, Akihisa is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Guo, Lihui; Kondo, Michio; Fukawa, Makoto; Saitoh, Kimihiko; Matsuda, Akihisa
- Publisher
- Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
- Published
- 1998
- Language
- EN
- Field
- Engineering (Physical Sciences)
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