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Can I read Coating Material Innovation in Conjunction with Optimized Deposition Technologies on EtoBox?
Coating Material Innovation in Conjunction with Optimized Deposition Technologies by M. Stolze; K. Leitner is a Engineering article available to read on EtoBox.
What is Coating Material Innovation in Conjunction with Optimized Deposition Technologies about?
Concentrating on physical vapour deposition methods several examples of recently developed coating materials for optical applications were studied for film deposition with optimized coating technologies: mixed evaporation materials for ion assisted deposition with modern plasma ion sources, planar metal and oxide sputter targets for Direct Current (DC) and Mid-Frequency (MF) pulsed sputter deposition and planar and rotatable sputter targets of transparent conductive oxides (TCO) for large-area sputter deposition. Films from specially designed titania based mixed evaporation materials deposited with new plasma ion sources and possible operation with pure oxygen showed extended ranges of the ratio between refractive index and structural film stress, hence there is an increased potential for the reduction of the total coating stress in High-Low alternating stacks and for coating plastics. DC and MF-pulsed sputtering of niobium metal and suboxide targets for optical coatings yielded essential benefits of the suboxide targets in a range of practical coating conditions (for absent in-situ post-oxidation ability): higher refractive index and deposition rate, better reproducibility and eas
Who reads Coating Material Innovation in Conjunction with Optimized Deposition Technologies?
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- M. Stolze; K. Leitner
- Publisher
- Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)
- Published
- 2009
- Language
- EN
- Field
- Engineering (Physical Sciences)