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About this scholarly article
2001 6th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.01EX443) - CVD SiGe(C) epitaxial growth and its application to MOS devices by Murota, J.; Sakuraba, M.; Matsuura, T. is a scholarly article available to read on EtoBox.
- Author
- Murota, J.; Sakuraba, M.; Matsuura, T.
- Publisher
- IEEE
- Published
- 2001
- Language
- EN