About this scholarly article

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Lithography manufacturing implementation for 65 nm and 45 nm nodes with model-based scattering bars using IML technology by Hsu, Michael; Smith, Bruce W.; Van Den Broeke, Doug; Laidig, Tom; Wampler, Kurt E.; Hollerbach, Uwe; Socha, Robert; Chen, J. F.; Hsu, Stephen; Shi, Xuelong is a scholarly article available to read on EtoBox.

Author

Hsu, Michael; Smith, Bruce W.; Van Den Broeke, Doug; Laidig, Tom; Wampler, Kurt E.; Hollerbach, Uwe; Socha, Robert; Chen, J. F.; Hsu, Stephen; Shi, Xuelong

Publisher

SPIE

Published

2005

Language

EN