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Negative Ion Density Measurements in Reactive Magnetron Sputtering by Robert Dodd; ShaoDong You; Paul M. Bryant; James W. Bradley is a Engineering article available to read on EtoBox.

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## Abstract A combination of laser photo‐detachment and conventional Langmuir probing has been used to obtain the bulk negative ion density in both a DC and radio frequency (RF) sputter magnetron. The argon and oxygen discharges were operated at low powers and over a range of pressures. The photo‐detachment signal is expected to reach a limiting value; however, the signal continues to increase with laser energy density and this can be attributed to a laser ablation effect. In the RF magnetron the electron temperature (__T__~e~) in oxygen decreased with increasing pressure, whereas the electron density (__N__~e~) increased from 0.53 to 8.6 × 10^14^ m^−3^. At around 12 mTorr, a sudden increase in __N__~e~ by 3.7 is accompanied by a small drop in __T__~e~. The negative ion density (__N__~−~) also increases with pressure reaching a maximum of 1.7 × 10^14^ m^−3^ between 5 and 10 mTorr. Under similar conditions, the DC magnetron negative ion fraction (__N__~−~/__N__~e~) is estimated to be ∼0.01, being significantly lower than in the RF magnetron where __N__~−~/__N__~e~ ≈ 1.

Who reads Negative Ion Density Measurements in Reactive Magnetron Sputtering?

Author

Robert Dodd; ShaoDong You; Paul M. Bryant; James W. Bradley

Publisher

John Wiley and Sons; Wiley (John Wiley & Sons); Wiley - V C H Verlag GmbbH & Co.; Wiley (ISSN 1612-8850)

Published

2009

Language

EN

Field

Engineering (Physical Sciences)