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This document provides details about the CP588 process for manufacturing small signal PNP transistors. The process uses epitaxial planar technology with a die size of 15 x 15 mils and thickness of 9 mils. It can produce over 53,000 dies per 4 inch wafer. Key transistor types that can be produced include the 2N2605, 2N3799, PN4250A, CMPT5086, and CMPT5087.

Author

arjeta

Language

EN