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About this Engineering article
Al-CMP Technique for Ultra-fine pitched Al-interconnect Formation in 0.1.MU.m-CMOS Eru. by Hayashi, Yoshihiro; Nakajima, Tsutomu is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Hayashi, Yoshihiro; Nakajima, Tsutomu
- Publisher
- The Japan Institute of Metals; Japan Institute of Metals (ISSN 1340-2625)
- Published
- 1997
- Field
- Engineering (Physical Sciences)