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About this Engineering article

Ultrahigh Purity Conditions for Nitride Growth with Low Oxygen Content by Plasma-enhanced Atomic Layer Deposition by Rayner, Gilbert B.; OâToole, Noel; Shallenberger, Jeffrey; Johs, Blaine is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author
Rayner, Gilbert B.; OâToole, Noel; Shallenberger, Jeffrey; Johs, Blaine
Publisher
AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-2101)
Published
2020
Field
Engineering (Physical Sciences)

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